发明名称 PHOTO-CURABLE RESIN COMPOSITION
摘要 The present invention relates to a photo-curable resin composition and, more particularly, to a photo-curable resin composition for forming micro patterns, the photo-curable resin composition being applicable to a flexible display substrate since the composition can be cured at high speed and has excellent coating properties, adhesive properties and acid resistance by virtue of comprising acrylamide monomer.
申请公布号 WO2015190799(A1) 申请公布日期 2015.12.17
申请号 WO2015KR05767 申请日期 2015.06.09
申请人 DONGJIN SEMICHEM.CO.,LTD 发明人 SONG, JUN YONG;SHIN, SEUNG HYUP;CHOI, MI KYUNG;JI, SEOK HWAN;CHEO, JUN HO;KIM, YONG WOO
分类号 C08F265/06;C08F220/56;C08F290/06 主分类号 C08F265/06
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