| 摘要 |
The present invention pertains to a solid state imaging apparatus, a method for manufacturing the same, and an electronic device, by which it is possible to improve the sensitivity of imaging pixels while maintaining the autofocus characteristics of focal point detection pixels. The solid state imaging apparatus is provided with: a pixel array section having a plurality of pixels; a first microlens formed for each pixel; a film formed so as to cover the first microlens of each pixel; and a second microlens formed on the film of each of the focal point detection pixels among the pixels. This technology can be applied to a CMOS image sensor, for example. |
