发明名称 PHOTOSENSITIVE COMPOSITION FOR PERMANENT FILMS, RESIST MATERIAL AND COATING FILM
摘要 The purpose of the present invention is to provide: a photosensitive composition which has excellent photosensitivity, resolution, heat resistance and moisture absorption resistance, while being insusceptible to contamination in high temperature environments, and which is suitable as a material for permanent films; and the like. The present invention provides a photosensitive composition for permanent films, which contains a hydroxynaphthalene novolac resin having a structural moiety (I) represented by general formula (1) as a repeating unit and containing a hydroxynaphthalene (A) represented by general formula (2) in an amount of 2% by mass or less in terms of resin solid content, and which does not contain a curing agent, or contains a curing agent in an amount of 50 parts by mass or less per 100 parts by mass of the above-described resin. (In the formulae, R1 represents a hydrogen atom, an alkyl group, an alkoxy group, an aryl group, an aralkyl group or a halogen atom, and a plurality of R1 moieties may be the same as or different from each other; R2 represents a hydrogen atom, an alkyl group or an aryl group; and p represents 1 or 2, and q represents 4 or 5, with the sum of p and q being 6.)
申请公布号 WO2015190233(A1) 申请公布日期 2015.12.17
申请号 WO2015JP64265 申请日期 2015.05.19
申请人 DIC CORPORATION 发明人 IMADA TOMOYUKI;KIMOTO SEIJI;SATO YUSUKE
分类号 G03F7/023 主分类号 G03F7/023
代理机构 代理人
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