| 摘要 |
PROBLEM TO BE SOLVED: To provide a multi-charged particle beam lithography method capable of complementing occurrence of data transfer error.SOLUTION: A multi-charged particle beam lithography method includes a step of applying a corresponding beam of ON beam, out of a multi-charged particle beam, to the drawing position of each beam, while performing a tracking control a step of shifting the drawing position of each beam to next drawing position of each beam while continuing the tracking control, a step of irradiating the drawing position of each shifted beam with a corresponding beam while continuing the tracking control, and a step of resetting beam deflection for tracking control after beam application. The steps from start of tracking control to the reset are repeated as one set, and the tracking time from start of tracking control to the reset in at least one set is longer than the tracking time in other set. |
