发明名称 |
EBEAM NON-UNIVERSAL CUTTER |
摘要 |
Lithographic apparatuses suitable for, and methodologies involving, complementary e-beam lithography (CEBL) are described. In an example, a blanker aperture array (BAA) for an e-beam tool is described. The BAA is a non-universal cutter. |
申请公布号 |
WO2015191106(A1) |
申请公布日期 |
2015.12.17 |
申请号 |
WO2014US71668 |
申请日期 |
2014.12.19 |
申请人 |
INTEL CORPORATION |
发明人 |
BORODOVSKY, YAN A.;NELSON, DONALD W.;PHILLIPS, MARK C. |
分类号 |
H01L21/027 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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