| 摘要 |
The present invention aims to provide a cleaning chemical supply apparatus, a cleaning chemical supply method, and a cleaning unit, which can flexibly deal with changes in the dilution ratio and can suppress an increase in the size of the apparatus. The cleaning chemical supply apparatus comprises: a first in-line mixer (72) for supplying a first cleaning chemical to a cleaning apparatus (200); a second in-line mixer (73) for supplying a second cleaning chemical to a substrate cleaning apparatus (200); a first chemical CLC box (120) for controlling the flux of the first chemical supplied to the first in-line mixer (72); a second chemical CLC box (130) for controlling the flux of the second chemical supplied to the second in-line mixer (73); and, a DIWCLC box (110) for controlling the flux of diluted water supplied to the first in-line mixer (72) or the second in-line mixer (73). The supplier of the diluted water is converted from the first in-line mixer (72) to the second in-line mixer (73) or from the second in-line mixer (73) to the first in-line mixer (72). |
