| 发明名称 |
EBEAM THREE BEAM APERTURE ARRAY |
| 摘要 |
Lithographic apparatuses suitable for, and methodologies involving, complementary e-beam lithography (CEBL) are described. In an example, a blanker aperture array (BAA) for an e-beam tool is described. The BAA includes three distinct aperture arrays of different pitch. |
| 申请公布号 |
WO2015191105(A1) |
申请公布日期 |
2015.12.17 |
| 申请号 |
WO2014US71665 |
申请日期 |
2014.12.19 |
| 申请人 |
INTEL CORPORATION |
发明人 |
BORODOVSKY, YAN A.;NELSON, DONALD W.;PHILLIPS, MARK C. |
| 分类号 |
H01L21/027 |
主分类号 |
H01L21/027 |
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