| 摘要 |
PROBLEM TO BE SOLVED: To provide a film formation method which is simple, is excellent in productivity, is excellent also in persistence and is used for imparting functionality by reforming the surface of substrate.SOLUTION: In a film formation method of substrate, a process (1) of forming an under-coat coated film layer by using a composition (1) containing a polymerizable unsaturated group-containing resin (A) having hydroxide group and a curing agent (B), a process (2) of forming a functionality-imparting layer on the substrate formed of the under-coat coated film layer on the process (1) by using a composition (2) which contains a functionality-imparting group-containing polymerizable unsaturated compound and a photo-polymerization initiator, and a process (3) of applying an active energy ray onto the substrate formed of the undercoat coated film layer and the functionality-imparting layer according to the processes (1), (2) are successively performed. |
