发明名称 NONVOLATILE SEMICONDUCTOR MEMORY TRANSISTOR AND METHOD FOR MANUFACTURING NONVOLATILE SEMICONDUCTOR MEMORY
摘要 A nonvolatile semiconductor memory transistor includes an island-shaped semiconductor having a source region, a channel region, and a drain region formed in this order from the silicon substrate side, a floating gate arranged so as to surround the outer periphery of the channel region with a tunnel insulating film interposed between the floating gate and the channel region, a control gate arranged so as to surround the outer periphery of the floating gate with an inter-polysilicon insulating film interposed between the control gate and the floating gate, and a control gate line electrically connected to the control gate and extending in a predetermined direction. The inter-polysilicon insulating film is interposed between the floating gate and the lower and inner side surfaces of the control gate and between the floating gate and the lower surface of the control gate line.
申请公布号 US2015364608(A1) 申请公布日期 2015.12.17
申请号 US201514837615 申请日期 2015.08.27
申请人 Unisantis Electronics Singapore Pte. Ltd. 发明人 MASUOKA Fujio;NAKAMURA Hiroki
分类号 H01L29/788 主分类号 H01L29/788
代理机构 代理人
主权项 1. A nonvolatile semiconductor memory transistor comprising: an island-shaped semiconductor having a channel region; a floating gate surrounding an outer periphery of the channel region and a tunnel insulating film interposed between the floating gate and the channel region; a control gate surrounding an outer periphery of the floating gate and an inter-polysilicon insulating film interposed between the control gate and the floating gate; and a control gate line electrically connected to the control gate and extending in a predetermined direction, wherein the inter-polysilicon insulating film is interposed between the floating gate and a lower surface and an inner side surface of the control gate and between the floating gate and a lower surface of the control gate line.
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