PHOTOSENSITIVE COMPOSITION, PHOTOCURABLE COMPOSITION, CHEMICAL AMPLIFICATION RESIST COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, METHOD OF MANUFACTURING ELECTRONIC DEVICE AND ELECTRONIC DEVICE

摘要

There is provided a photosensitive composition containing a compound represented by Formula (I), and the Formula (I) is defined as herein,;;and chemical amplification resist composition containing the photosensitive composition, wherein the photosensitive composition further contains a compound capable of generating an acid upon irradiation with an actinic ray or radiation, and a chemical amplification resist composition containing the photosensitive composition, wherein the photosensitive composition further contains a compound capable of generating an acid upon irradiation with an actinic ray or radiation.

主权项

1. A photosensitive composition containing a compound represented by the following Formula (I): in Formula (I), Y represents a monovalent organic group, R1 represents a monovalent organic group, each of R2 and R2′ independently represents a hydrogen atom, an alkyl group, a cycloalkyl group, an aryl group, or a heteroaryl group, and R2 and R2′ may be bound with each other to form a nitrogen-containing heterocyclic group.