| 发明名称 |
LITHOGRAPHY APPARATUS, AND METHOD OF MANUFACTURING ARTICLE |
| 摘要 |
The present invention provides a lithography apparatus which sequentially irradiates, with a beam, a first region and a second region, that have a stitching region in common, on a substrate to form a pattern on the substrate, the apparatus including a processor configured to respectively give weights to first information of a position of the second region before irradiation of the first region with a beam and second information of a position of the second region after the irradiation to obtain information of a position of the second region. |
| 申请公布号 |
US2015362842(A1) |
申请公布日期 |
2015.12.17 |
| 申请号 |
US201514736435 |
申请日期 |
2015.06.11 |
| 申请人 |
CANON KABUSHIKI KAISHA |
发明人 |
Ogawa Shigeki;Ina Hideki |
| 分类号 |
G03F7/20;G03F7/26;G03F7/16 |
主分类号 |
G03F7/20 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A lithography apparatus which sequentially irradiates, with a beam, a first region and a second region, that have a stitching region in common, on a substrate to form a pattern on the substrate, the apparatus comprising:
a processor configured to respectively give weights to first information of a position of the second region before irradiation of the first region with a beam and second information of a position of the second region after the irradiation to obtain information of a position of the second region. |
| 地址 |
Tokyo JP |
