| 摘要 |
A plasma processing apparatus according to an embodiment is provided with a processing container, a stage, a plurality of heaters, and a power supply device. The stage is provided inside the processing container. The plurality of heaters are provided inside the stage. The power supply device supplies electric power to the plurality of heaters. The power supply device has a plurality of transformers and a plurality of zero-cross-control solid-state relays (SSRs). The plurality of transformers are configured to step down the voltage from an alternating-current power source. Each of the plurality of transformers has a primary coil and a secondary coil. The primary coils are connected to the alternating-current power source. Each of the plurality of SSRs is provided between one corresponding heater among the plurality of heaters, and the secondary coil of one corresponding transformer among the plurality of transformers. |
