发明名称 |
ELECTRIC/MAGNETIC FIELD GUIDED ACID DIFFUSION |
摘要 |
Methods and apparatuses for minimizing line edge/width roughness in lines formed by photolithography are provided. The random diffusion of acid generated by a photoacid generator during a lithography process contributes to line edge/width roughness. Methods disclosed herein apply an electric field and/or a magnetic field during photolithography processes. The field application controls the diffusion of the acids generated by the photoacid generator along the line and spacing direction, preventing the line edge/width roughness that results from random diffusion. Apparatuses for carrying out the aforementioned methods are also disclosed herein. |
申请公布号 |
WO2015191209(A1) |
申请公布日期 |
2015.12.17 |
申请号 |
WO2015US30396 |
申请日期 |
2015.05.12 |
申请人 |
APPLIED MATERIALS, INC. |
发明人 |
XIE, PENG;GODET, LUDOVIC;MA, TRISTAN;OLSON, JOSEPH C.;BENCHER, CHRISTOPHER |
分类号 |
H01L21/027 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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