发明名称 CRYSTALLINE MULTIPLE-NANOSHEET STRAINED CHANNEL FETS AND METHODS OF FABRICATING THE SAME
摘要 A field effect transistor includes a body layer having a strained crystalline semiconductor channel region, and a gate stack on the channel region. The gate stack includes a crystalline semiconductor gate layer that is lattice mismatched with the channel region, and a crystalline gate dielectric layer between the gate layer and the channel region. Related devices and fabrication methods are also discussed.
申请公布号 WO2015190852(A1) 申请公布日期 2015.12.17
申请号 WO2015KR05902 申请日期 2015.06.11
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 OBRADOVIC, BORNA J;BOWEN, ROBERT C.;RODDER, MARK S
分类号 H01L29/78 主分类号 H01L29/78
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