发明名称 Semiconductor Device Die Singulation by Discontinuous Laser Scribe and Break
摘要 A method for singulating a semiconductor device dies from a wafer, and a singulated semiconductor device die is disclosed. In one embodiment, the method includes forming a plurality of recesses in a surface of the wafer along the edges of the semiconductor device dies to be singulated, each of the recesses having a tapered inner surface. The method further includes applying pressure to an opposite surface of the wafer along the edges of the semiconductor device dies, separating the edges of the semiconductor device dies from the wafer. In one embodiment, the recesses are formed by a pulsed laser. In one embodiment, the pressure is applied by a wafer breaking machine.
申请公布号 US2015364374(A1) 申请公布日期 2015.12.17
申请号 US201414303345 申请日期 2014.06.12
申请人 Toshiba Corporation 发明人 Hamaguchi Norihito;Lin Chao-Kun
分类号 H01L21/78;H01L23/544;H01L29/04;H01L21/268 主分类号 H01L21/78
代理机构 代理人
主权项 1. A method of singulating a semiconductor device die from a wafer, the method comprising: forming a plurality of recesses in a surface of the wafer in a dicing street direction along the edges of the semiconductor device die to be singulated, each of the plurality of recesses being spaced apart from an adjacent recess in the range of 1.5 μm to 4 μm and having a tapered inner surface; and applying pressure to an opposite surface of the wafer along the edges of the semiconductor device die, separating the edges of the semiconductor device die from the wafer.
地址 Tokyo JP