发明名称 |
ANTIREFLECTION COATING AND OPTICAL ELEMENT INCLUDING THE SAME |
摘要 |
Provided is an antireflection coating to be formed on a substrate comprising a first layer, a second layer, a third layer and a fourth layer that are laminated in order from the substrate side to the air side. In the antireflection coating, a refractive index of material of the substrate for the reference wavelength of 550 nm ns, a refractive index of material of the first layer for the reference wavelength of 550 nm n1, a physical film thickness of the first layer d1, a refractive index of material of the fourth layer n4, and a physical film thickness of the fourth layer d4 are appropriately set. |
申请公布号 |
US2015362632(A1) |
申请公布日期 |
2015.12.17 |
申请号 |
US201514737820 |
申请日期 |
2015.06.12 |
申请人 |
CANON KABUSHIKI KAISHA |
发明人 |
Uchida Kazue |
分类号 |
G02B1/115 |
主分类号 |
G02B1/115 |
代理机构 |
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代理人 |
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主权项 |
1. An antireflection coating to be formed on a substrate,
the antireflection coating comprising a first layer, a second layer, a third layer and a fourth layer that are laminated in order from the substrate side to the air side, the antireflection coating satisfying the following conditional expressions:
ns≧1.651.3≦n1≦1.7n1≦ns 1.15≦n4≦1.300.018λ≦nl×d1≦0.125λ0.18λ≦n4×d4≦0.27λ where λ represents a reference wavelength of 550 nm, ns represents a refractive index of material of the substrate for the reference wavelength, n1 represents a refractive index of material of the first layer for the reference wavelength, d1 (nm) represents a physical film thickness of the first layer, n4 represents a refractive index of material of the fourth layer, and d4 (nm) represents a physical film thickness of the fourth layer. |
地址 |
Tokyo JP |