| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a method for producing a polishing liquid composition with which it is possible to give a polished work that has a reduced surface roughness and a reduced amount of particles. <P>SOLUTION: The method for producing the polishing liquid composition includes a step in which a raw silica dispersion containing colloidal silica having an average primary-particle diameter of 1-100 nm is filtered through a filter including a filter aid, the filter aid having an average pore diameter, as measured by the mercury intrusion method, of 0.1-3.5μm. <P>COPYRIGHT: (C)2012,JPO&INPIT</p> |
