| 摘要 |
PROBLEM TO BE SOLVED: To provide a resist composition which can obtain a resist pattern with good CD uniformity and with reduced defects.SOLUTION: A resist composition contains (A1) resin having a structural unit represented by a formula (I), (A2) resin that has a structural unit represented by a formula (II) and is insoluble or poorly soluble in an aqueous alkali solution but becomes soluble in the aqueous alkali solution by the action of acid, and (B) an acid generator. In the formulas, Rrepresents a hydrogen atom or a methyl group; Arepresents an alkanediyl group; Rrepresents a hydrocarbon group having a fluorine atom; ring Trepresents a sultone ring that may contain a substitution group; Zrepresents an alkanediyl group or the like that may contain a substitution group; and Zrepresents a single bond or a carbonyl group. |
