| 摘要 |
PROBLEM TO BE SOLVED: To provide a mold structure which has a sectional shape of a top of a projecting part in an arrangement direction formed into a round shape, therefore has an enhanced pressurizing force to an imprint resist layer and a reduced residual film, is excellent in the uniformity of the residual film on the entire surface of a substrate, has enhanced durability and can transfer a pattern of high quality to a discrete track media and a patterned media, and can form the high quality pattern thereon, and to provide an imprint method and the like. SOLUTION: The mold structure has a disk like substrate and a projecting and recessed part formed on the surface of the substrate by arranging a plurality of projecting parts with the surface as a reference, and the sectional shape of the top of the projecting part in the arrangement direction which is round. Such an embodiment or the like that an top of the projecting part has≥2 nm radius of curvature, that a ratio [(B/A)×100] of a contact area B of the top of the projecting part with a body transferred to a bottom area A of the projecting part is 10 to 90% is preferable. COPYRIGHT: (C)2009,JPO&INPIT
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