发明名称 |
TEMPERATURE CONTROL METHOD FOR CHILLER APPARATUS |
摘要 |
PURPOSE: A temperature control method for a chiller apparatus is provided to prevent damage to a wafer and low production yield due to high temperatures by controlling the temperature of a electrode plate and a chamber constantly. CONSTITUTION: A caloric value of a brine pump is calculated(S31). The minimum power amount of the brine heater is set(S32). The cooling control set value is calculated based on the minimum power amount of the heater(S33). The expansion valve installed at an evaporator is controlled based on the cooling control set value and the cooling control of the brine is performed(S34). The heating compensation output control of the cold-controlled brine is performed by the set heater minimum power amount of the heater(S35).
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申请公布号 |
KR20100013508(A) |
申请公布日期 |
2010.02.10 |
申请号 |
KR20080075052 |
申请日期 |
2008.07.31 |
申请人 |
PTC |
发明人 |
KIM, DAE YEOL;HAN, MIN JIN;HWANG, SE YEON;LIM, CHAE SUNG;JI, OK KYU |
分类号 |
H01L23/38;H01L23/34;H01L23/36;H01L23/367 |
主分类号 |
H01L23/38 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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