| 发明名称 |
METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE |
| 摘要 |
A method for manufacturing a semiconductor device includes: performing modifying a surface of a semiconductor wafer including a silanol group on the surface with an alkylsilyl group; and fluorinating an alkyl group of the alkylsilyl group with which the surface was modified.
|
| 申请公布号 |
US2010022098(A1) |
申请公布日期 |
2010.01.28 |
| 申请号 |
US20090503599 |
申请日期 |
2009.07.15 |
| 申请人 |
MATSUNAGA KENTARO;ITO SHINICHI |
发明人 |
MATSUNAGA KENTARO;ITO SHINICHI |
| 分类号 |
H01L21/31 |
主分类号 |
H01L21/31 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
|
| 地址 |
|
