发明名称 |
Plasma Processing Apparatus And Method |
摘要 |
A plasma processing apparatus includes a sample stage disposed at a lower part of a processing chamber, a bell jar made of an insulative material constituting an upper portion of a vacuum vessel, a coil antenna disposed outside and around the bell jar to which electric power is supplied so as to generate the plasma in a plasma generating space inside of the bell jar, and a Faraday shield mounted on the bell jar and disposed between an external surface of the bell jar and the coil antenna. A ring shaped member made of an electric conductive material is disposed inside of an inner surface of a ring portion of the processing chamber located below a skirt portion of the bell jar and constitutes a part of the processing chamber. The ring shaped member extends upwardly so as to cover a portion of an inner surface of the bell jar.
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申请公布号 |
US2010018649(A1) |
申请公布日期 |
2010.01.28 |
申请号 |
US20090575514 |
申请日期 |
2009.10.08 |
申请人 |
NISHIO RYOJI;YOSHIOKA KEN;KANAI SABUROU;KANEKIYO TADAMITSU;KIHARA HIDEKI;OKUDA KOJI |
发明人 |
NISHIO RYOJI;YOSHIOKA KEN;KANAI SABUROU;KANEKIYO TADAMITSU;KIHARA HIDEKI;OKUDA KOJI |
分类号 |
H01L21/3065;C23C16/44;C23C16/455;C23C16/458;C23C16/507;H01J37/32;H01L21/00 |
主分类号 |
H01L21/3065 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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