| 摘要 |
A contact lithography apparatus, system and method use a deformation to facilitate pattern transfer. The apparatus, system and method include a spacer that provides a spaced apart parallel and proximal orientation of lithographic elements, such as a mask and a substrate, when in mutual contact with the spacer. One or more of the mask, the substrate and the spacer is deformable, such that deformation thereof facilitates the pattern transfer.
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