Block polymer, cosmetic composition comprising the same and cosmetic treatment method

摘要

Polymer sequence comprising at least a first sequence and at least a second sequence incompatible with each other, where the sequences have glass transition temperature of = 20[deg] C, and at least one ethylene glycol monomer (I) (0.5-100 wt.%), is new. Polymer sequence comprising at least a first sequence and at least a second sequence incompatible with each other, where the sequences have glass transition temperature of = 20[deg] C, and at least one ethylene glycol monomer of formula (H 2C=C(R 1)((Z) x-(R 2) m-(CH 2CH 2O) n-R 3)) (I) (0.5-100 wt.%), is new. R 1H or CH 3; Z : divalent group comprising -COO-, -CONH-, -CONCH 3-, -OCO-, -O-, -SO 2-, -CO-O-CO- or -CO-CH 2-CO-; x : 0 or 1; R 2optionally saturated, aromatic, linear, branched or cyclic 1-30C divalent carbon radical comprising 1-18 heteroatoms of O, N, S, F, Si or P; m : 0 or 1; n : 3-300; and R 3H or optionally saturated, aromatic, linear, branched or cyclic carbon radical of 1-30C comprising 1-20 heteroatoms of O, N, S, F, Si or P. An independent claim is included for a cosmetic composition comprising the polymer sequence in a medium.