| 摘要 |
<p>This invention provides a composition for antireflection film formation, having a predetermined level of pH, which has excellent storage stability and matching properties with a resist film and coatability, and can form an antireflection film having satisfactory optical properties. The composition for an antireflection film formation is a composition for the formation of an antireflection film provided on a resist film. The composition comprises a water-soluble film forming component and a predetermined fluorine compound. In the composition for antireflection film formation, the pH value can easily be regulated without deteriorating coatability by adding a predetermined fluorine compound, and a composition for antireflection film formation, having excellent storage stability and matching properties with a resist film can be provided. Further, since the fluorine compound can also contribute to an improvement in optical properties of the antireflection film, and, thus, a composition for antireflection film formation, which can form an antireflection film having excellent optical properties, can also be provided.</p> |
