发明名称 |
Ultra high precision measurement tool |
摘要 |
<p>A focused ion beam device (100) is described comprising a gas field ion source (10) with an analyzer (175) for analyzing and classifying the structure of a specimen (120), a controller for controlling and/or modifying the structure of the specimen according to the analysis of the analyzer, an emitter tip (20), the emitter tip has a base tip (22) comprising a first material and a supertip (25) comprising a material different from the first material, wherein the supertip is a single atom tip and the base tip is a single crystal base tip. Furthermore, the focused ion beam device has a probe current control and a sample charge control. A method of operating a focused ion beam device is provided comprising applying a voltage between a single emission centre of the supertip and an electrode, supplying gas to the emitter tip, analyzing and classifying the structure of a specimen, and controlling the structure of the specimen.</p> |
申请公布号 |
EP2124245(A1) |
申请公布日期 |
2009.11.25 |
申请号 |
EP20080156665 |
申请日期 |
2008.05.21 |
申请人 |
ICT, INTEGRATED CIRCUIT TESTING GESELLSCHAFT FUERHALBLEITERPRUEFTECHNIK MBH |
发明人 |
FROSIEN, JUERGEN;WINKLER, DIETER;WEIGEL, UDO;GRIMM, STEFAN |
分类号 |
H01J37/08;H01J27/02;H01J27/26;H01J37/26;H01J37/304 |
主分类号 |
H01J37/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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