发明名称 Ultra high precision measurement tool
摘要 <p>A focused ion beam device (100) is described comprising a gas field ion source (10) with an analyzer (175) for analyzing and classifying the structure of a specimen (120), a controller for controlling and/or modifying the structure of the specimen according to the analysis of the analyzer, an emitter tip (20), the emitter tip has a base tip (22) comprising a first material and a supertip (25) comprising a material different from the first material, wherein the supertip is a single atom tip and the base tip is a single crystal base tip. Furthermore, the focused ion beam device has a probe current control and a sample charge control. A method of operating a focused ion beam device is provided comprising applying a voltage between a single emission centre of the supertip and an electrode, supplying gas to the emitter tip, analyzing and classifying the structure of a specimen, and controlling the structure of the specimen.</p>
申请公布号 EP2124245(A1) 申请公布日期 2009.11.25
申请号 EP20080156665 申请日期 2008.05.21
申请人 ICT, INTEGRATED CIRCUIT TESTING GESELLSCHAFT FUERHALBLEITERPRUEFTECHNIK MBH 发明人 FROSIEN, JUERGEN;WINKLER, DIETER;WEIGEL, UDO;GRIMM, STEFAN
分类号 H01J37/08;H01J27/02;H01J27/26;H01J37/26;H01J37/304 主分类号 H01J37/08
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