发明名称 |
FABRICATION OF MICROSTRUCTURES AND NANOSTRUCTURES USING ETCHING RESIST |
摘要 |
Nanostructures and microstructures are formed by patterning methods such as Dip Pen Nanolithography (DPN) or microcontact printing of organic molecules functioning as a resist on a substrate followed by an etching step. The etch resist is a patterning composition and can contain on a substrate including polyethylene glycol (PEG). Positive and negative etch methods can be used. |
申请公布号 |
EP2122417(A2) |
申请公布日期 |
2009.11.25 |
申请号 |
EP20070873494 |
申请日期 |
2007.12.17 |
申请人 |
NORTHWESTERN UNIVERSITY |
发明人 |
MIRKIN, CHAD, A.;HUANG, LING;SANEDRIN, RAYMOND |
分类号 |
G03F7/00;B82B3/00;B82Y10/00;B82Y30/00 |
主分类号 |
G03F7/00 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|