发明名称 SUBSTRATE PROCESSING APPARATUS
摘要 PROBLEM TO BE SOLVED: To eliminate unnecessary maintenance by re-performing a sequence causing an error in a substrate processing apparatus. SOLUTION: The substrate processing apparatus includes a processing chamber for processing a substrate, a carrying means for carrying the substrate and a first control means for controlling the carrying means in accordance with a predetermined carrying sequence composed of a plurality of sequences, wherein if an error occurs while the carrying means is carrying the substrate, the first control means temporarily suspends the performance of the carrying sequence, and then stops processing when receiving stop processing, and when receiving retrial processing, re-performs the sequence causing the error occurrence out of the carrying sequence. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009135433(A) 申请公布日期 2009.06.18
申请号 JP20080256588 申请日期 2008.10.01
申请人 HITACHI KOKUSAI ELECTRIC INC 发明人 YASHIMA TSUKASA;KOSHIUMI YUTAKA;NOGAMI SHIGEMOTO;TERANISHI ISAO
分类号 H01L21/02;H01L21/31;H01L21/677 主分类号 H01L21/02
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