发明名称 SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREFOR
摘要 <p>On each side of a bonding pad (101) which surrounds a bonding opening (108), a slit-shaped space area (107) is provided and is separated into an area (101a) on the side of the bonding opening (108) of the bonding pad (101) and an area (101b) on the side of a wiring layer (102) adjacent to the area (101a), having a space area (107a) as a boundary. Since the area (101b) is separated from the area (101a) by a width of the space area (107a) and has a part of a passivation film (103), which is a soft material compared with a metal material, buried therein, heat stress is absorbed and diffused by the space area (107a) and diffusion of metal atoms from the area (101a) to the area (101b) is remarkably suppressed.</p>
申请公布号 KR100903696(B1) 申请公布日期 2009.06.18
申请号 KR20077011623 申请日期 2007.05.22
申请人 发明人
分类号 H01L21/60 主分类号 H01L21/60
代理机构 代理人
主权项
地址