| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an electron beam lithography apparatus and method, which can concentrically draw circles by electron beam lithography in such a manner that a start point and an end point of the circle are connected with high precision. <P>SOLUTION: The apparatus includes: a controller for controlling a beam deflection portion on the basis of a synchronization signal in order to deflect the electron beam while drawing transition is performed from one circle to another circle after the drawing of the one circle is completed; and a beam cutoff portion for cutting off the irradiation with the electron beam on the substrate for a prescribed period directly before or directly after the transition to another circle while the irradiation position with the electron beam is transferred to another circle. <P>COPYRIGHT: (C)2009,JPO&INPIT |
