PATTERN SIZE MEASURING METHOD, AND SCANNING ELECTRON MICROSCOPE

摘要

PROBLEM TO BE SOLVED: To take measurements with high precision and low damage that have been hardly taken so far in a method of measuring a pattern size in an observation area on a sample with an incident electron beam. SOLUTION: The method of measuring the size of the pattern in the observation area from information on the intensity of a reflected electron or secondary electron generated by the incident electron beam scanning of the observation area on the sample is characterized in that one image is created by superposing a plurality of electron microscope images obtained by irradiating a plurality of observation areas on the sample with the electron beam, and the size of the pattern is measured from intensity information on the one image. COPYRIGHT: (C)2009,JPO&INPIT