| 摘要 |
To suppress the occurrence of image quality irregularities in a liquid crystal display device having a TFT substrate which is manufactured by performing steps a plurality of times in such a manner that one region is divided into a plurality of exposure regions, and the plurality of exposure regions is exposed. In a manufacturing method of a display device which performs, for a preliminarily determined one region on a surface of an insulation substrate, an exposure/development step including a step of exposing a formed film made of a photosensitive material and a step of developing an exposed film made of the photosensitive material a plurality of times, said each exposure step is performed such that said one region is divided into the plurality of exposure regions by a boundary line which has no overlapping portion and is not aligned with a boundary line between the exposure regions in the exposure step for at least one time out of other exposure steps, and the whole of said one region is exposed by individually exposing the respective exposure regions.
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