发明名称 Gas field ionization ion source, scanning charged particle microscope, optical axis adjustment method and specimen observation method
摘要 It is an object of the present invention to improve the stability of a gas field ionization ion source. A GFIS according to the present invention is characterized in that the aperture diameter of the extraction electrode can be set to any of at least two different values or the distance from the apex of the emitter to the extraction electrode can be set to any of at least two different values. In addition, solid nitrogen is used for cooling. According to the present invention, it is possible to not only let divergently emitted ions go through the aperture of the extraction electrode but also, in behalf of differential pumping, reduce the diameter of the aperture. In addition, it is possible to reduce the physical vibration of the cooling means. Consequently, it is possible to provide a highly stable GFIS and a scanning charged particle microscope equipped with such a GFIS.
申请公布号 US2009152462(A1) 申请公布日期 2009.06.18
申请号 US20080314553 申请日期 2008.12.12
申请人 HITACHI HIGH-TECHNOLOGIES CORPORATION 发明人 ISHITANI TOHRU;OSE YOICHI;SHICHI HIROYASU;MATSUBARA SHINICHI;HASHIZUME TOMIHIRO;FUKUDA MUNEYUKI
分类号 G01N23/00;H01J27/26;H01J37/04;H01J37/08;H01J37/28;H01T23/00 主分类号 G01N23/00
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