HOLOGRAPHIC SURFACE MASK ETCHING AND OPTICAL STRUCTURES
摘要
The invention is directed to a method for etching a solid state material to create a surface relief pattern. A resist layer is formed on the surface of the solid state material. The photoresist layer is holographically patterned to form a patterned mask. The pattern is then transferred into the solid state material by a dry etching process. The invention is especially useful for forming optical nanostructures. In preferred embodiments, a direct write process, such as e-beam lithography, is used to define defects and functional elements, such as waveguides and cavities.
申请公布号
WO2004010167(A3)
申请公布日期
2009.06.18
申请号
WO2003US22608
申请日期
2003.07.18
申请人
THE REGENTS OF THE UNIVERSITY OF CALIFORNIA;FAINMAN, YESHAIAHU;NAKAGAWA, WATARU;CHEN, CHYONG-HUA;SUN, PANG-CHEN;PANG, LIN
发明人
FAINMAN, YESHAIAHU;NAKAGAWA, WATARU;CHEN, CHYONG-HUA;SUN, PANG-CHEN;PANG, LIN