FABRICATION OF MICROSTRUCTURES AND NANOSTRUCTURES USING ETCHING RESIST
摘要
Nanostructures and microstructures are formed by patterning methods such as Dip Pen Nanolithography (DPN) or microcontact printing of organic molecules functioning as a resist on a substrate followed by an etching step. The etch resist is a patterning composition and can contain on a substrate including polyethylene glycol (PEG). Positive and negative etch methods can be used.
申请公布号
WO2008121137(A3)
申请公布日期
2009.06.18
申请号
WO2007US25722
申请日期
2007.12.17
申请人
NORTHWESTERN UNIVERSITY;MIRKIN, CHAD, A.;HUANG, LING;SANEDRIN, RAYMOND