| 摘要 |
<p>An alignment method, an alignment system and a produce with an alignment mark are provided to obtain high reflection efficiency by using different polarization elements in a first region and a second region. In a step mode, a mask table(MT) and a substrate table(WT) are maintained in a stop state. A whole pattern given to the radiation beam is projected to the upper part of a target part at a time. The substrate table is shifted to X and/or Y direction to expose the different target. In the step mode, the maximum size of the exposure filed limits the size of the target imaged in the single static exposure. In a scan mode, the mask table and the substrate table are scanned for a period of projecting the pattern given to the radiation beam to the upper part of the target. The speed and the direction of the substrate table based on the mask table are determined by the expansion and image conversion characteristic of the projection system.</p> |
