| 摘要 |
A photosensitive resin composition for a color filter is provided to show excellent heat resistance, chemical resistance, development margin and adhesion. A photosensitive resin composition for a color filter comprises: a cardo-based resin represented by the formula 1; a photosensitive acrylic resin containing repeat units of the formula 2a~2d; a reactive unsaturated compound; pigments; an initiator; and a solvent. In the formula 1, R1~R4 are identically or independently hydrogen, halogen or substituted or non-substituted C1-C5 alkyl groups; R7 is vinyl, acrylic or methacrylic group; Z is residue of acid anhydride or acid dianhydride; X is -CO-, -SO2-, -CRR"- or -SiRR"-, wherein R and R" is identically or independently hydrogen, fluoroalkyl or alkyl group; and k satisfies the inequality of 1<=k<=40. In the formula 2a~2d, R8~R11 are identically or independently hydrogen, methyl or hydroxymethyl; R12 is substituted or non-substituted C1-C10 alkyl group or substituted or non-substituted aryl group; R13 is C1-C10 alkyl with hydroxyl groups; and R14 is substituted or non-substituted C2-C15 alkyl, cycloalkyl or aryl group. |
