发明名称 WASTE GAS PROCESSING DEVICE PROVIDED WITH SUPPLEMENTARY HEAT PROCESSING PART
摘要 A waste gas processing device provided with supplementary heat treatment part is provided to maintain the center and the edge region of the chamber in the high temperature atmosphere and enhance the process efficiency of the wasted gas. The gas scrubber having the supplementary processing part comprises the side of heat treatment(100), the chamber(200), and the cooling part(400) and the supplementary heat treatment part(300). The heat treatment part purifies the wasted gas by using the heat of the high temperature. The chamber is combined with the heat treatment part through the upper portion to provide the treatment space of the wasted gas. The cooling part cools the wasted gas which is positioned in the lower portion of the chamber. The subsidiary heat treatment part is positioned around the chamber to supply the heat to the chamber.
申请公布号 KR20090061834(A) 申请公布日期 2009.06.17
申请号 KR20070128801 申请日期 2007.12.12
申请人 KOREA PIONICS CO., LTD. 发明人 KWON, OH KYUNG;OH, HEE GEUN;HAN, YONG GI
分类号 H01L21/02 主分类号 H01L21/02
代理机构 代理人
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