发明名称 GRAY TONE MASK, PATTERN TRANSFER METHOD AND GRAY TONE MASK BLANK
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a gray tone mask capable of suppressing the occurrence of electrostatic damages in a pattern during handling when the mask is used. <P>SOLUTION: The gray tone mask has a mask pattern on a transparent substrate, the mask pattern comprising a light-shielding part, a light-transmitting part and a light-semitransmitting part that reduces a predetermined amount of the transmitted amount of exposure light used upon using the mask, and the gray tone mask is used for forming a desired transfer pattern including segments with different residual film values on a transfer object by selectively decreasing dose of exposure light on the transfer object in accordance with regions. A conductive film is formed on the whole surface of the transparent substrate, on which the mask pattern is formed and the light-shielding part or the light-semitransmitting part of each mask pattern in a region where at least the mask pattern is formed within the substrate plane is electrically equipotential through the conductive film. <P>COPYRIGHT: (C)2009,JPO&INPIT</p>
申请公布号 JP2009086383(A) 申请公布日期 2009.04.23
申请号 JP20070256930 申请日期 2007.09.29
申请人 HOYA CORP 发明人 SANO MICHIAKI;IMURA KAZUHISA;MITSUI MASARU
分类号 G02F1/1362;G03F1/40;G03F1/50;G03F1/54;G03F7/20 主分类号 G02F1/1362
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