发明名称 METHOD FOR CLEANING HEAT MODE TYPE RECORDING MEDIUM LAYER, METHOD FOR MANUFACTURING PRODUCT HAVING RECESS AND PROJECTION, METHOD FOR MANUFACTURING LIGHT EMITTING ELEMENT AND METHOD FOR MANUFACTURING OPTICAL ELEMENT
摘要 <p>Provided is a method for cleaning a heat mode type recording material layer for removing foreign materials (D) generated at the time of forming a plurality of recessed sections (15) on a recording material layer (12) whose shape can be changed in heat mode, by irradiating the recording layer with collected light. The foreign materials (D) are removed by a liquid (L) which remains reacted to the recording material layer (12). Such method for cleaning the heat mode type recording material layer is applicable to a method for manufacturing a product having a recess and a projection, a method for manufacturing a light emitting element and a method for manufacturing an optical element.</p>
申请公布号 WO2009050858(A1) 申请公布日期 2009.04.23
申请号 WO2008JP02818 申请日期 2008.10.07
申请人 FUJIFILM CORPORATION;USAMI, YOSHIHISA 发明人 USAMI, YOSHIHISA
分类号 B08B3/08;B08B3/04 主分类号 B08B3/08
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