发明名称 |
METHOD FOR CLEANING HEAT MODE TYPE RECORDING MEDIUM LAYER, METHOD FOR MANUFACTURING PRODUCT HAVING RECESS AND PROJECTION, METHOD FOR MANUFACTURING LIGHT EMITTING ELEMENT AND METHOD FOR MANUFACTURING OPTICAL ELEMENT |
摘要 |
<p>Provided is a method for cleaning a heat mode type recording material layer for removing foreign materials (D) generated at the time of forming a plurality of recessed sections (15) on a recording material layer (12) whose shape can be changed in heat mode, by irradiating the recording layer with collected light. The foreign materials (D) are removed by a liquid (L) which remains reacted to the recording material layer (12). Such method for cleaning the heat mode type recording material layer is applicable to a method for manufacturing a product having a recess and a projection, a method for manufacturing a light emitting element and a method for manufacturing an optical element.</p> |
申请公布号 |
WO2009050858(A1) |
申请公布日期 |
2009.04.23 |
申请号 |
WO2008JP02818 |
申请日期 |
2008.10.07 |
申请人 |
FUJIFILM CORPORATION;USAMI, YOSHIHISA |
发明人 |
USAMI, YOSHIHISA |
分类号 |
B08B3/08;B08B3/04 |
主分类号 |
B08B3/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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