MICRODISCHARGE LIGHT SOURCE CONFIGURATION AND ILLUMINATION SYSTEM

摘要

A novel plasma source configuration system based on an arrangement of microdischarges is presented with particular emphasis on the generation of radiation for next-generation lithographic integrated circuit manufacturing, microscopy and medical/biological imaging. The present invention makes substantive improvements to the current state-of-the-art by specifically addressing known deficiencies, problems limiting high-volume manufacturing and cost-of-ownership considerations. In particular, the present invention enables a series of innovative illumination configurations that can improve lithographic tool design and performance.