发明名称 |
METHOD OF INHIBITING COPPER CORROSION DURING SUPERCRITICAL CO2 CLEANING |
摘要 |
<p>A method for the pre-treatment of a wafer substrates with exposed metal surfaces is disclosed. The pre-treatment reduces oxidation of the exposed metal surfaces during subsequent supercritical cleaning processes.</p> |
申请公布号 |
WO2006107514(A3) |
申请公布日期 |
2009.04.23 |
申请号 |
WO2006US08732 |
申请日期 |
2006.03.07 |
申请人 |
SUPERCRITICAL SYSTEMS INC.;HILLMAN, JOSEPH, T. |
发明人 |
HILLMAN, JOSEPH, T. |
分类号 |
H01L21/302;H01L21/44 |
主分类号 |
H01L21/302 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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