发明名称 MASKLESS EXPOSURE APPARATUS AND MASKLESS EXPOSURE METHOD
摘要 <P>PROBLEM TO BE SOLVED: To provide a maskless exposure apparatus capable of highly accurately forming an exposure pattern of an element or the like of a temperature sensor on a curved surface, such as the surface of an inner race or an outer race of a bearing device. <P>SOLUTION: The maskless exposure apparatus includes an optical means 18 for shaping light from an exposure light source 14 as spot light and emitting the spot light to an exposed face EF, emission area changing means 12, 22 for changing an emission area of the spot light emitted from the optical means to the exposed fade and for changing a changing speed of a spot light area, and an exposure pattern control means 24 for controlling ON/OFF of the exposure light source and for controlling the emission area changing means to form a prescribed exposure pattern on the exposed face. <P>COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009086189(A) 申请公布日期 2009.04.23
申请号 JP20070254463 申请日期 2007.09.28
申请人 NSK LTD 发明人 OGUCHI HISAAKI
分类号 G03F7/20 主分类号 G03F7/20
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