发明名称 NANOPARTICLE PRODUCTION METHOD USING FORCED ULTRATHIN FILM ROTATING TREATMENT METHOD
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a nanoparticle precipitation method as a production method capable of stably performing mass-production by using the agitation and instantaneous uniform mixing of a plurality of fluids in a minute passage. <P>SOLUTION: The nanoparticle production method provided comprises keeping a 1 mm or less minute clearance between two treating faces capable of approaching and separating each other and rotating relative to each other, using the space between the two treating faces kept at that minute clearance as a passage for the fluids to be treated, thereby forming a forced thin film of the fluids, wherein performing the deposition of nanoparticles. <P>COPYRIGHT: (C)2009,JPO&INPIT</p>
申请公布号 JP2009082902(A) 申请公布日期 2009.04.23
申请号 JP20080176388 申请日期 2008.07.04
申请人 M TECHNIQUE CO LTD 发明人 ENOMURA SHINICHI
分类号 B02C7/14;B01J19/00;B82B3/00 主分类号 B02C7/14
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