SEMICONDUCTOR ELEMENT AND METHOD FOR PROCESSING OF A SEMICONDUCTOR ELEMENT

摘要

A semiconductor element (10) comprises a first region (11) with a number of recesses (17, 20, 23) which extend from a first primary surface (13) of the semiconductor element (10) into a substrate (31) of the semiconductor element (1). In addition the semiconductor element (10) comprises a second region (12) in the first primary surface (13) which is surrounded by the first region (11).