发明名称 SILICA GLASS CRUCIBLE, PROCESS FOR PRODUCTION OF THE SAME, AND PULLING METHOD
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a silica glass crucible which can satisfactorily disperse external radiation heat and inhibit nonuniformity of silicon melt temperature and exhibits excellent thermal conductivity and which enables the formation of silicon melt in a short heating time and the formation of a uniformly heated state over a wide area in the whole crucible, and to provide a method for producing the silica crucible. <P>SOLUTION: The silica glass crucible comprises an outer face layer made of a bubble-containing silica glass layer and an inner face layer made of a silica glass layer in which bubbles are not observed with the naked eye, wherein an interlayer made of a laminate composed of a bubble-containing silica glass layer (bubble-containing layer) which contains bubbles of 100μm or below in diameter with the bubble content by volume of 0.1% or above and a silica glass layer (transparent glass layer) which has a bubble content by volume of 0.05% or below is present between the outer face layer and the inner face layer. <P>COPYRIGHT: (C)2009,JPO&INPIT</p>
申请公布号 JP2009084113(A) 申请公布日期 2009.04.23
申请号 JP20070256155 申请日期 2007.09.28
申请人 JAPAN SIPER QUARTS CORP 发明人 KANDA MINORU
分类号 C30B15/10;C03B20/00 主分类号 C30B15/10
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