发明名称 |
SUBSTRATE DRYING DEVICE, DEVICE FOR MANUFACTURING FLAT PANEL DISPLAY, AND FLAT PANEL DISPLAY |
摘要 |
PROBLEM TO BE SOLVED: To avoid an influence on a chamber of a substrate drying device by shortening a drying time for a substrate. SOLUTION: The substrate drying device has: a conveyance means 10 for conveying the substrate W horizontally or obliquely at a predetermined angle; an air knife nozzle 23 for removing liquid on the substrate by blowing air A to the substrate W conveyed by the conveying means 10 while having the liquid formed on its surface; and a steam supply means 22 disposed upstream from the air knife nozzle 23 of the conveying means 10 to supply steam S heated at predetermined temperature to the substrate W. The substrate W is heated using the steam S and then heated in a short time to improve processing efficiency. At the same time, the temperature abruptly falls after the steam S imparts heat energy to the substrate W, so an influence on the chamber can be avoided. COPYRIGHT: (C)2009,JPO&INPIT
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申请公布号 |
JP2009088442(A) |
申请公布日期 |
2009.04.23 |
申请号 |
JP20070259789 |
申请日期 |
2007.10.03 |
申请人 |
HITACHI HIGH-TECHNOLOGIES CORP |
发明人 |
MORIGUCHI YOSHIHIRO |
分类号 |
H01L21/304;B08B3/02;G02F1/13;G02F1/1333;H01L21/677 |
主分类号 |
H01L21/304 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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