发明名称 SUBSTRATE DRYING DEVICE, DEVICE FOR MANUFACTURING FLAT PANEL DISPLAY, AND FLAT PANEL DISPLAY
摘要 PROBLEM TO BE SOLVED: To avoid an influence on a chamber of a substrate drying device by shortening a drying time for a substrate. SOLUTION: The substrate drying device has: a conveyance means 10 for conveying the substrate W horizontally or obliquely at a predetermined angle; an air knife nozzle 23 for removing liquid on the substrate by blowing air A to the substrate W conveyed by the conveying means 10 while having the liquid formed on its surface; and a steam supply means 22 disposed upstream from the air knife nozzle 23 of the conveying means 10 to supply steam S heated at predetermined temperature to the substrate W. The substrate W is heated using the steam S and then heated in a short time to improve processing efficiency. At the same time, the temperature abruptly falls after the steam S imparts heat energy to the substrate W, so an influence on the chamber can be avoided. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009088442(A) 申请公布日期 2009.04.23
申请号 JP20070259789 申请日期 2007.10.03
申请人 HITACHI HIGH-TECHNOLOGIES CORP 发明人 MORIGUCHI YOSHIHIRO
分类号 H01L21/304;B08B3/02;G02F1/13;G02F1/1333;H01L21/677 主分类号 H01L21/304
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