| 摘要 |
A low-index silica coating may be made by forming silica sol including a silane and/or a colloidal silica. The silica precursor may be deposited on a substrate (e.g., glass substrate) to form a coating layer. The coating layer may then be cured and/or fired using temperature(s) of from about 550 to 700° C. A barrier undercoating including a metal oxide, such as, silica, alumina, titania, zirconia, and/or an oxynitride of silica may be deposited between the coating layer and substrate. Preferably, the barrier undercoating does not substantially affect the percent transmission or reflection of the low-index silica coating. The low-index silica based coating may be used as an antireflective (AR) film on a front glass substrate of a photovoltaic device (e.g., solar cell) or any other suitable application in certain example instances.
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