STABILIZATION OF SELF-ASSEMBLED MONOLAYERS

摘要

Self-assembled monolayers and other solid support/surface-layer systems are widely used as resists for nanofabrication because of its closely packed structure, low defect density, and uniform thickness. However these resists suffer the drawback of low stability in liquid due to desorption and/or oxidation induced desorption. Stabilized solid support/surface-layer systems and methods of preserving the integrity and structure of self-assembled monolayers on solid surfaces are provided. The method involves adding small amount of amphiphilic molecules, such as DMF and DMSO, into aqueous solutions as preserving media. These molecules adhere favorably to defect sites within monolayers and inhibit the initiation of both known degradation pathways: oxidation and desorption. Also provided are stabilized systems including the solid support/surface-layer system and stabilizing solution, as well as kits of stabilizing solutions for use with various systems.