发明名称 EXPOSURE HEAD AND IMAGE FORMATION APPARATUS USING THE SAME
摘要 <p><P>PROBLEM TO BE SOLVED: To provide an exposure head which corrects deviation of an image exposure position, thereby improving image quality, and to provide an image formation apparatus using the same. <P>SOLUTION: The exposure head includes: a base 101; a substrate 102 disposed on the base 101, the substrate having a plurality of light emitting elements 103 disposed thereon; and an n (n is an integer greater than or equal to one) number of imaging optical systems 105, each of which has a negative optical magnification, the imaging optical systems focusing light beams emitted from the plurality of light emitting elements 103 disposed on the substrate 102. <P>COPYRIGHT: (C)2009,JPO&INPIT</p>
申请公布号 JP2009056796(A) 申请公布日期 2009.03.19
申请号 JP20080175398 申请日期 2008.07.04
申请人 SEIKO EPSON CORP 发明人 YAMAGUCHI KENJI;INOUE NOZOMI;NOMURA YUJIRO
分类号 B41J2/44;B41J2/45;B41J2/455;G03G15/00;G03G15/01;G03G15/04;H04N1/036 主分类号 B41J2/44
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